Abstract

We have explored the photodetection properties of a core-shell nanowire (NW) heterojunction based device consisting of p-Si/n-InP with an aim to provide an alternative to Si based photodetector by integrating a III-V material, viz. InP with silicon. The core is p-Si NWs, prepared by metal assisted chemical etching of p-type Si (100) substrate at room temperature using Ag nanoparticles, whereas n-type InP shells were deposited by metal organic chemical vapor deposition. The current-voltage characteristics of the device resemble that of a p-n junction with good rectification ratio in the dark, and provides photoresponse under visible and near-infrared (NIR) spectral region at low reverse bias condition. In the NIR regime, it shows an on/off ratio of 23 with a rise and fall time of 387 ms and 424 ms, respectively, at a reverse bias voltage of 2 V. The device exhibits a peak responsivity and detectivity of 2.749 A/W and 5.52 × 1011 Jones, respectively, at 920 nm under the same reverse bias voltage. Thus p-SiNW/n-InP core-shell based device could have the potential to be developed as an optoelectronic device beyond the traditional p-n junction exploiting its radial heterojunction based structure.

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