Abstract
Structure of the near-field intensity and polarization distributions, the latter is described with the generalized 3D Stokes parameters, of a spherical Si subwavelength nanoparticle in a non-magnetic and non-absorbing media near a dielectric substrate has been studied in detail with the help of the Mie theory and an extension of the Weyl's method for the calculation of the reflection of dipole radiation by a flat surface. It is shown that for the nanoparticle near the substrate the interference effects due to the scattering by the nanoparticle and interaction with the substrate play an essential role. We also demonstrate how these effects depend on the dielectric properties of the nanoparticle, its size, distance to the substrate as well as on the polarization, wavelength and incident angle of the external light field.
Highlights
Аlong with plasmonic nanoparticles, the nanoparticles made of high refractive dielectric or semiconductor materials have recently received considerable attention in the nanophotonics for their ability to control and manipulate the light in the near-field [4, 5]
We have studied a structure of the near-field of a spherical Si nanoparticle in a non-magnetic and non-absorbing media near a dielectric substrate with the help of the Mie theory for scattering by a sphere in a homogeneous medium and an extension of the Weyl's method for calculation of the reflection of dipole radiation by a flat surface [5, 6]
The intensity and polarization distributions have been obtained by this method
Summary
The nanoparticles made of high refractive dielectric or semiconductor materials have recently received considerable attention in the nanophotonics for their ability to control and manipulate the light in the near-field [4, 5]. They allow direct engineering a magnetic field response at optical frequencies in addition to the electric field response in plasmonic structures.
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