Abstract
A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by photochemical bleaching of a monomolecular layer of dye molecules chemically bound to an APTES SAM, 2) a chemical process induced by oxygen plasma etching as well as 3) a combined near-field UV-photochemical and ozone-induced chemical process, which is applied directly to an APTES SAM. All approaches employ a sandwich configuration of the surface-supported SAM, and a lithographic mask in form of gold nanostructures fabricated through colloidal sphere lithography (CL), which is either exposed to visible light, oxygen plasma or an UV–ozone atmosphere. The gold mask has the function to inhibit the photochemical reactions by highly localized near-field interactions between metal mask and SAM and to inhibit the radiation-induced chemical reactions by casting a highly localized shadow. The removal of the gold mask reveals the SAM nanopattern.
Highlights
Chemical nanopatterns consist of spatially separated areas providing different chemically reactive groups
A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by photochemical bleaching of a monomolecular layer of dye molecules chemically bound to an APTES silane monolayers (SAM), 2) a chemical process induced by oxygen plasma etching as well as 3) a combined near-field UV-photochemical and ozone-induced chemical process, which is applied directly to an APTES SAM
Three realizations of near-field photochemical and radiationinduced chemical fabrication processes of SAM nanopatterns were explored: 1) a photochemical process, in which chemical nanopatterning is achieved by selective photochemical bleaching of a monolayer of dye molecules chemically bound to an APTES SAM; 2) a chemical process by oxygen-plasma etching as well as 3) a combined UV-photochemical and ozoneinduced chemical process for SAMs of organosilanes
Summary
Chemical nanopatterns consist of spatially separated areas providing different chemically reactive groups They form templates for the spatially defined fabrication of functionalities for the attachment of, e.g., biomolecules [1,2,3], polymers [4,5,6], or other organic or inorganic nanoparticles [7,8] with nanometer precision. The metal mask has an inhibitory function and protects the dye from photochemical bleaching by quenching the excited state of the dye molecules through energy transfer from the excited state to the metal [23]. The short range of the dipolar near field of the excited molecule and of the energy transfer process leads to the potentially high resolution of the near-field photochemical process
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