Abstract
Direct-write lithography on a 100 nm scale has been carried out using the near-field optical interaction between an uncoated tapered fiber tip and a layer of photoresist. This allows both lithography and shear force microscopic examination of the surface, which reveals morphological changes in the photoresist before development.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.