Abstract
The structural and magnetic properties of Co films on Si(100) with a 100 nm Nb buffer layer were investigated by metallurgical microscope, atomic force microscope (AFM), scanning electron microscope (SEM), and magneto-optical Kerr effect (MOKE). The Nb buffer layer was deposited onto the Si(100) substrate by sputter deposition method, after which we electrodeposited thin Co films onto the top. The constitute of the electrolyte were 0.1 M CoSO4(aq) 30 ml and 0.5 M H3BO3(aq) 1.5 ml. A systematical study was made to investigate the influences of the depositing current (I), total charge (Qt), and type of current on the surface topography and the magnetic properties of the electrodeposited Co films. The physical mechanism is discussed in this thesis. This research is helpful for us to understand the physical properties of the electrodeposited Co/100 nm Nb / Si(100) system. Furthermore, this builds up a systematical process for us to investigate the properties of magnetic thin film which are electrodeposited on different metal thin film electrode.
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