Abstract
Nature of traps responsible for the memory effect in Si3N4 still remains the subject matter of much discussion. Based on our quantum chemical simulation results, Si–Si bonds can be identified as traps for electrons and holes with localization energies falling within the ranges of Wte=1.2−1.7 eV and Wth=0.9−1.4 eV. Within the multiphonon trap ionization model, our experimental data on Si3N4 conductivity have allowed us to evaluate the thermal ionization energies of electron and hole traps in Si3N4 as Wte=Wth=1.4 eV. The same value of 1.4 eV was obtained as half the Stokes shift of the 2.4 eV green photoluminescence line observed in Si3N4 films under excitation with 5.2 eV. Thus, the data obtained in the present study strongly suggest that Si–Si bonds are responsible for localization of electrons and holes in Si3N4.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
