Abstract

We report on the formation of UV emitting Si nanoclusters (NCs) in Si, using a two stageAu implantation technique. These Si NCs, with an average size of 2 nm, showphotoluminescence at room temperature, over a narrow band of about 100 meV with a peakof emission near 3.3 eV. With emission lifetimes in the range of 1.5–2.5 ns, thetransitions seem to come from excitonic recombinations across a quasi-direct gap.Since the structures are below the surface, there is no adverse effect of oxidationresulting in a shift in emission wavelength. On the other hand, an annealing at500 °C has been found to result in a significant increase in the emission intensity. This is due tolocalized plasmon induced electric field enhancement in Au nano-islands in the vicinity.

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