Abstract
a: C–N x films were deposited on Si(111) wafers at ambient temperatures by reactive magnetron sputtering of C in a mixed Ar/N2 discharge. The hardness (H) and elastic modulus (E) were assessed via nanoindentation using a Berkovich diamond indenter. The nitrogenated films exhibited increased hardness and elastic moduli values compared to the amorphous carbonated films, i.e., 25 and 240 GPa to 16 and 160 GPa, respectively. A sphere-on-flat (magnetic tape) wear tester was used to assess wear scar volume losses as a function of wear time. All films were in a state of compression (intrinsic and thermal stress). The bonding, composition, and structure of the films for all the deposition conditions were assessed by micro-Raman spectroscopy, energy dispersive x-ray spectroscopy (EDX), and x-ray diffraction (XRD), respectively, and subsequently correlated to overall film properties.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
