Abstract
High entropy alloy (HEA) and highly nanotwinned (NT) material with improved ductility and high strength demonstrate promising potential compared to nanocrystalline materials and traditional metallic alloys. In this study, CoCrFeNi-based medium entropy alloy (MEA) thin films with nanotwinned structure (NT) was fabricated by sputtering technology and their corresponding properties and microstructure were investigated. The NT-MEA thin films show simple face centered cubic (FCC) structure with nearly 100% (111) texture and twin thickness in 1.8–2.8 nm. The NT-MEA thin films exhibit both low electrical resistivity (100 ± 2 μΩ-cm) and high hardness (8.0–9.15 GPa) with low roughness (Rms < 1.3 nm). By controlling the substrate bias, the residual stress of the CoCrFeNi thin film can be manipulated from compressive (−0.89 GPa) to tensile (+0.6 GPa) without scarifying the hardness.
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