Nanostructuring polymers by soft lithography templates realized via ion sputtering

Abstract

We demonstrate that a combination of ion sputtering and soft lithography is an alternativeand effective way of nanostructuring soft matter. We create self-organized nanoscalestructures on a glass template by irradiating the surface with a defocused, low energy Arion beam. Capillary force lithography is then used to transfer the pattern, exploiting theglass transition of polymeric layers. In particular, we demonstrate the pattern transfer of aperiodic 150 nm ripple structure onto an organic compound. This new, unconventionalcombination is then a low-cost strategy that opens the way to a variety of applications inthe field of organic-based devices.