Abstract
We present a method for the controlled fabrication of stable nanostructures under ambient conditions. The surfaces under consideration, WSe2, are imaged by an atomic force microscope. By applying a voltage between the tip and the sample, we can control an etching process at the surface: different voltage thresholds for the creation and the growth of structures of one monolayer (Se–W–Se) depth are observed. Our measurements on p-doped WSe2 strongly support an electrochemical corrosion reaction in a physisorbed water film. This method allows the in situ preparation and characterization of individual nanometer-sized structures on WSe2 and other metal dichalcogenides.
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