Abstract
Abstract We report the use of gold, nickel and diamond nanoparticles as a masking material for realization of diamond nano-structures by applying the dry plasma etching process. Applying low power plasma (100 W) in a gas mixture of CF4/O2 for 5 minutes results in a formation of three different types of diamond nanostructures, depending on the mask type material and particle size. Using of the Ni mask results in realization of diamond nano-rods, applying of the Au mask brings cauliflower-like structures, and using the diamond powder allows the production of irregular nano-structures. The main advance of the presented etching procedure is use of a self-assembly strategy where no lithographic steps are implemented.
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