Abstract
ABSTRACT Atomic force microscope (AFM) lithography based on localized current injection was carried out for fabricating nanostructures of metal oxide on tantalum (Ta). Fabricated nanopatterns of tantalum oxide (Ta2O5) were selectively etched by magnetically enhanced inductively coupled plasma (MEICP) etching system. Nanopatterns of Ta with feature size in the range of a few tens-hundreds nm were successfully fabricated.
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