Nanostructured TiO2: Analysis and characterization

Abstract

Nanostructured TiO2 thin films were deposited on quartz glass at room temperature by sol–gel dip coat-ing method. The effects of annealing temperature between 200◦C to 1100◦C were investigated on the structural, morphological, and optical properties of these films. The X-ray diffraction results showed that nanostructured TiO2 thin film annealed at between 200◦C to 600◦C was amorphous trans- formed into the anatase phase at 700◦C, and further into rutile phase at 1000◦C. The crystallite size of TiO2 thin films was increased with increasing annealing temperature. From atomic force microscopy images, it was confirmed that the microstructure of annealed thin films changed from column to nubbly. Besides, surface roughness of the thin films in- creases from 1.82 to 5.20 nm, and at the same time, average grain size as well grows up from about 39 to 313 nm with increase of the annealing temperature. The transmittance of the thin films annealed at 1000 and 1100◦C was reduced significantly in the wavelength range of about 300–700 nm due to the change of crystallite phase. Refractive index and optical high dielectric constant of the n-TiO2 thin films were in- creased with increasing annealing temperature, and the film thickness and the optical band gap of nanostructured TiO2 thin films were decreased.