Abstract
Tantalum nitride (TaN x) films are usually used as barriers to the diffusion of copper in the substrate for electronic devices. In the present work, the TaN x coating plays an extra role in the iron catalyzed chemical vapor deposition production of carbon nanotubes (CNT). The CNTs were grown at 850 °C on TaN x films prepared by radio frequency magnetron sputtering. The correlation between the CNT morphology and growth rate, and the pristine TaN x film nature, is investigated by comparing the evolution of the nano-composition, roughness and nano-crystallinity of the TaN x films both after annealing and CVD at 850 °C.
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