Abstract
In this paper, the structure and electrochromic properties of nickel oxide films by rf sputtering process have been studied using HREM and cyclic voltammetry. The experimental results show that the nanostructured nickel oxide films with grain size about 5–10nm possess excellent electrochromic characteristics and their performances becomes poorer with increasing the amount of amorphous phase or the size of nanocrystalline grains in the films. To relate it with the electrochromism proposed by the authors, it is believed that the large quantity of grain boundaries existing in the nanocrystalline films play an important role for the transport of alkali metal ions during the electrochromic process.
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