Abstract
Nanostructured multi-layer MgF2/ITO coatings were deposited on glass substrate at various substrate temperatures (25 °C, 100 °C, 250 °C, 350 °C) for electromagnetic interference (EMI) shielding applications via e-beam evaporation. The as-deposited multi-layer MgF2/ITO coating was crystalline with crystallite size ∼25 nm and 20–30 nm for MgF2 and ITO, respectively. The coating thickness of MgF2 and ITO obtained via Rutherford backscattering technique (RBS) was determined to be 19 nm and 122 nm, respectively. Stoichiometry of the coatings was confirmed by RBS and EDS. The surface roughness depended on the substrate temperature during the deposition and decreased from approx. 10 nm at 25 °C to 4 nm at 350 °C. The highest value of optical transmittance in the visible range was obtained for MgF2/ITO at 25 °C reaching 94% at approx. 550 nm. The optical band gap of the coatings was determined to be in the range of 3.85–3.99 eV, which decreases with the increase of annealing temperature. The coatings showed significant conductivity suitable for EMI applications reaching 5.57 × 106 Ω−1 cm−1 for MgF2/ITO at 250 °C. The EMI shielding effectiveness of 68.1 dB was obtained for MgF2/ITO at 350 °C without scarifying the transmittance, which is suitable for aerospace and defense applications.
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