Abstract
The present investigation is devoted to the X-ray photoelectron spectroscopy (XPS) analysis of the main core levels (C 1s, O 1s, Dy 4d, Dy 3d) of a representative dysprosium(III) oxide thin film. The specimen was grown on Si(100) at 500 °C by metal organic chemical vapor deposition (MOCVD) starting from Dy((iPrN)2CNMe2)3 in an N2/O2 atmosphere. The above route yielded uniform and homogeneous nanostructured Dy2O3 films characterized by a remarkable reactivity towards atmospheric CO2 and H2O, resulting in the surface co-presence of dysprosium carbonates/bicarbonates and hydroxides. The most relevant spectral features are presented and discussed.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
