Abstract
An atomic force microscope operated in tapping mode using a homemade bent optical fiber probe was used to pattern nanometer-scale features. Trenches of different dimensions were written on polycarbonate that was pre-exposed to an excimer laser. Lines with widths varying from 260 to 600 nm and depths ranging from 30 to 120 nm have been made. The present technique as a complementary tool to other lithographic processes has been demonstrated to be potentially suitable for low-cost and high-precision applications.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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