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Abstract
In this work, structural and optical properties of the TiO2 films deposited on unheated substrates by dual cathode dc unbalanced magnetron sputtering at long substrate-target distance (ds-t) were studied. Titanium dioxide (TiO2) thin films were deposited on unheated Si (110) wafers, glass slides and carbon coated copper grids at different substrate to target (ds-t) distances. The structural properties of TiO2 thin films were characterized by X-ray diffraction (XRD) and transmission electron microcopy (TEM) with selected-area electron diffraction (SAED), surface morphology using atomic force microscopy (AFM) and optical transmission spectra using a spectrophotometer. XRD results show that TiO2 films deposited at various ds-t distances have only rutile crystal structure. The crystallinity and thickness of the films increased while the roughness decreased with decreasing ds-t distance. The refractive indices of the deposited films were found to be in the range of 2.51 - 2.82 and increased with decreasing ds-t distance.
Highlights
During the past two decades, nanocrystalline titanium dioxide (TiO2) thin films have attracted a great deal of interest due to their photocatalytic properties and photoinduced superhydrophilicity [1] [2] [3] [4].In general, TiO2 exists in both crystalline and amorphous forms
The structural properties of TiO2 thin films were characterized by X-ray diffraction (XRD) and transmission electron microcopy (TEM) with selected-area electron diffraction (SAED), surface morphology using atomic force microscopy (AFM) and optical transmission spectra using a spectrophotometer
The electrons generated during the sputtering of coating cathode could be trapped in an unbalanced magnetic field (UMF), which results in a plasma being directed onto the substrate surface and relatively low voltage ion bombardment of the growing film surface due to self-bias potential [22]
Summary
During the past two decades, nanocrystalline titanium dioxide (TiO2) thin films have attracted a great deal of interest due to their photocatalytic properties and photoinduced superhydrophilicity [1] [2] [3] [4].In general, TiO2 exists in both crystalline and amorphous forms. Crystalline TiO2 exists in three different phases: anatase, rutile and brukite. The anatase phase is suitable for photocatalytic activities and superhydrophilic properties, white the rutile phase is widely used for optical applications [1]-[8]. Most of the TiO2 films prepared by the above-mentioned methods are either amorphous or anatase. Among these methods, the reactive magnetron sputtering is one of the most widely used methods for the deposition of TiO2 thin films. As reported in the literature, the TiO2 films deposited on unheated substrates by dc reactive magnetron sputtering often exhibit an amorphous phase. To obtain the rutile phase, the films have to be heated during or after the deposition at a high temperature above 600 ̊C [2] [8] [14] [15] [16] [17] [18]
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