Abstract
Carbon nanowalls (CNWs), which are three-dimensional carbon nanomaterials consisting of stacks of graphene sheets vertically standing on substrates, possess a mazelike architecture containing high-density graphene edges and large-area plane surfaces. A selective morphological modification technique for the surfaces of CNWs after their growth has been developed employing hydrogen peroxide (H2O2) solution. It was found that oxidative radicals in H2O2 solution formed characteristic nanometer-scale asperities on the CNW surface without etching from the top edges. Photoelectron spectra indicate that hydroxyl adsorption and subsequent reactions at the edge and plane of graphene contribute to the selective morphological change on the CNW surface.
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