Abstract
plasma. We show that the result can be an array of parallel wires as narrow as 68 nm or an array of parallel Si trenches as narrow as 85 nm. The laser-focused deposition process is inherently parallel, so a large area is patterned simultaneously with an accurate periodicity of 212.78 nm. This method represents a novel way to make large, coherent arrays of sub-100 nm-size structures.
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