Nano-scale patterning using the roll typed UV-nanoimprint lithography tool

Abstract

Nanoimprint lithography is a promising technology to produce sub-100nm half-pitch features on silicon wafers. To achieve nano-imprinting process, nano-imprinting lithography equipment must have required some multi-functional units which are imprinting head, self-alignment wafer stage, overlay and alignment system for multi-layer process, stamp with sub-100nm half-pitch patterns, and anti-vibration unit, etc. Although imprinting process has many advantages in terms of low cost, high throughput and reproducibility, these imprinting technologies have a limitation to increase imprinting area and imprinting tool sizes. Also, air entrap phenomenon which is generated between the stamp and the resist surfaces during imprinting process is getting important parameter in the press type imprinting process. In order to get over these limitations and the air entrap and to fabricate large area product, such as above 8in. wafer, display unit and multi-functional device, roll typed UV-nanoimprint lithography tool are certainly necessary. In this study, the roll typed UV-nanoimprint lithography tool which is can be loaded PDMS (polydimethylsiloxane), polycarbonate and PET film as soft stamp, is proposed.