Abstract

Recently discovered phenomenon of low thermal conductivity of porous silicon (PS) layers is discussed in detail. A proposed theoretical model explains the considerable decrease of the thermal conductivity of nanoscale PS in comparison with meso-PS and bulk silicon. The thermal conductance dependence of Si/porous Si structures on the formation conditions of PS layers has been studied. By varying the values of anodisation current density and anodisation time it is possible to optimize the thermal conductance values of the Si/porous Si structures. In this way, an efficient thermal isolation can be obtained by forming thick PS layers.

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