Abstract
The self-assembly of a lamellar-forming polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D3). The number average molecular weight (Mn), polydispersity index (Mw/Mn) and PS volume fraction (φps) of the DBCP were MnPS = 23.0 kg mol−1, MnPDMS = 15.0 kg mol−1, Mw/Mn = 1.06 and φps = 0.6. Thin films of the DBCP were cast and solvent annealed on topographically patterned polyhedral oligomeric silsesquioxane (POSS) substrates. The lamellae repeat distance or pitch (λL) and the width of the PDMS features (dL) are ~35 nm and ~17 nm, respectively, as determined by SEM. The chemistry of the POSS substrates was tuned, and the effects on the self-assembly of the DBCP noted. The PDMS nanopatterns were used as etching mask in order to transfer the DBCP pattern to underlying silicon substrate by a complex plasma etch process yielding sub-15 nm silicon features.
Highlights
To maintain historic improvements in the performance of semiconductor electronics (Moore’s Law), the dimensions of critical circuit elements are shrinking towards 10 nm [1]
The details of the steps involved in the fabrication of Polyhedral oligomeric silsesquioxane (POSS) template and the subsequent diblock copolymer (DBCP)
Self-assembly and plasma etching are presented in Scheme deposited The on PDMS-OH
Summary
To maintain historic improvements in the performance of semiconductor electronics (Moore’s Law), the dimensions of critical circuit elements are shrinking towards 10 nm [1]. One form of guiding structure is well-defined surface topography (graphoepitaxy) and nanoimprint lithography (NIL). The structure is well-defined surface topography (graphoepitaxy) andpolystyrene-b-poly(dimethylsiloxane) nanoimprint lithography (NIL) is a technique cost-effective meansand for generating patterns (PS-b-PDMS). Allowing formation of small the self-assembly of a diblock copolymer (DBCP), controlling alignment (to surface direction) and microdomain sizes [25]. Orientation (relative to the surface plane), as was first reported by Li et al on polystyrene-bWork on the PS-b-PDMS system has been very largely limited to cylinder forming systems, and the poly(methylmethacrylate) (PS-b-PMMA) [22]. It is necessary to control materials can be tailored allow definition of surface three such POSS sidewall chemistry, butto to produce appropriate surfacechemistry chemistry toderivatives define patternand orientation. Results and Discussion structures, but can be used to understand surface chemistry effects in these systems
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