Abstract
AbstractA simple method is developed for producing patterned polymer surfaces with reactive groups. This entails pulsed plasma deposition of anhydride functionalized films, followed by the covalent attachment of an amine‐terminated nucleophile via aminolysis reaction. Patterning is achieved by deep‐UV (DUV) irradiation using an ArF excimer laser (193 nm), allowing a fabrication of periodical structures with typical dimensions ranging from the nano‐ to microscale. The impact of the duty cycle during plasma polymer deposition and the impact of amine exposure time on the DUV response are investigated. Study of the relation between the polymer structure and photosensitivity allows a deeper understanding of the photoinduced mechanisms.magnified image
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