Abstract
A new method is described for producing patterned solid surfaces with reactive groups.This entails pulsed plasma deposition of anhydride functionalized films, followed by thecovalent attachment of an amine-terminated nucleophile via aminolysis reaction.Characterization of the surface chemistry was achieved by XPS, PM-IRRAS and contactangle measurement. Patterning was achieved by DUV irradiation using an ArF excimerlaser and an interferometric set-up. Well-defined patterns have been obtained at differentscales on a large surface area and using this unique procedure. Spectroscopiccharacterizations coupled with AFM measurements allow explanation to some measure ofthe photoinduced phenomena. Trenches with a width ranging from 75 to 500 nm anda depth up to 30 nm were written. Using this approach it is possible to createcombinatorial patterned surfaces with well-controlled topography and chemistry.
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