Abstract
Abstract During dewetting of a solid-state thin film on a substrate, the film tends to agglomerate into islands to reduce its total interfacial energy, which can be utilized as an economical pattern formation technique. In this work, we are using a three-dimensional phase-field model to understand the conditions and the mechanisms of island formation through pinch-off during dewetting of a finite cylindrical film on a substrate. It is observed that the pinch-off is mostly affected by the wetting angle, which is a function of interfacial energies between substrate, film, and vapor. The role of the aspect ratio of the cylindrical rod on island (nanoparticle) formation is also analysed.
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