Abstract
The demand for materials and devices with dimensions on the nanometer scale continues to increase. To meet this demand, high-throughput, cost-effective methods for depositing nanoscale thin films are needed. In the past few years, atmospheric pressure spatial atomic layer deposition (AP-SALD) has emerged as a potential nanomanufacturing method that is scalable, open air, and operates at modest temperatures that are compatible with flexible substrates. In this Perspective, we compare AP-SALD to other high-throughput techniques for depositing nanometer-scale thin films, including gravure printing, screen printing, knife-over-edge coating, slot-die coating, inkjet printing, spray deposition, as well as high-throughput sputtering and evaporation. Although AP-SALD does not provide the same patterning capabilities as some of these printing techniques, it offers multiple advantages: it produces continuous, conformal coatings with few defects; it requires minimal thermal treatment of the deposited materials; it p...
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