Abstract
A nanoliter droplet deposition unit was developed and characterized for application of sample preparation in TXRF. The droplets produced on quartz reflectors as well as on wafers show a good reproducibility, also the accuracy of the pipetted volume could be proved by a quantitative TXRF analysis using an external standard. The samples were found to be independent of rotation of the sample carrier. Angle scans showed droplet residue behavior, and the fluorescence signal is relatively invariant of the angle of incidence below the critical angle, which is useful for producing standards for external calibration for semiconductor surface contamination measurements by TXRF. Further it could be demonstrated that the nanoliter deposition unit is perfectly able to produce patterns of samples for applications like the quantification of aerosols collected by impactors.
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