Abstract
Abstract We tested the nanomechanical properties of various materials (Si, SiO2, Si3N4, AlCu, TiN) for the design of stamps used in nanoimprint lithography. Nanoindentation was used on both insulated and non-insulated areas. The test enabled an estimation of the nanohardness and Young’s modulus of the tested materials (films). The results are very useful for selecting the material for a protective film on the stamps used in nanoinprinting lithography.
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Schedule a callMore From: International Journal of Materials Research (formerly Zeitschrift fuer Metallkunde)
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