Abstract
We report on a method of making dielectric loaded surface-plasmon-polariton waveguides by nanoimprint lithography from master structures fabricated using two-photon polymerization. This method employing molds from polydimethylsiloxane allows rapid reproduction of waveguide structures using a large variety of resist and substrate materials. Both master and imprinted samples are characterized and compared. Measurements are performed on the imprinted samples using leakage radiation microscopy.
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