Abstract
Silicon-oxide-backboned hybrid thin films with thicknesses around 600 nm were fabricated through plasma enhanced chemical vapor deposition from tetraethyl orthosilicate mixed with hexamethyldisiloxane as precursors, and their subnano-scaled holes, generated by annealing at 560 °C, were investigated by means of the positron lifetime technique with a pulsed, low-energy positron beam. The hole dimension was quantified from the ortho-positronium lifetime for the as-prepared and annealed films with different compositions. The effect of the heat treatment and the precursor composition on the subnano holes was discussed.
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