Abstract
Results on nanoscale structuring of different substrates (silicon, pyrolytic graphite, indium-tin-oxide) using clusters from 20 to 100 atoms in size formed from gaseous precursors (O 2, N 2, Ar) at relatively low impact energy up to 15 keV are presented. Images of the substrate surfaces after cluster collisions obtained using atomic force microscopy show the formation of hillocks from a few to 15 nm height with a basal diameter from 50 to 300 nm depending on implantation conditions. The shape and size of the structures are found to be a function of the cluster size and species, implantation energy, impact angle and the type of substrate. A model explaining the hillock formation is discussed.
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