Abstract
One step required for the fabrication of a quantum dot array on an aluminum substrate is the preparation of a flat aluminum surface. To enable the optimization of the electropolishing procedure, atomic force microscopy was used to examine the morphology of electropolished polycrystalline aluminum surfaces that were prepared under different electropolishing conditions. The electropolishing voltage, time, and temperature were varied. Two distinctly different surface morphologies were observed for different electropolishing conditions and transitional structures were observed for intermediate conditions. It was found that the type of surface morphology and the surface roughness could be controlled primarily with the electropolishing voltage while temperature and time had relatively little effect over the range examined in this study.
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