Abstract
The concept of growing nanosize particles on polarized ferroelectric domain areas is known as ferroelectric lithography (FL). Here, a further step of technical development was achieved by combining nanoembossing technique with the FL to realize the selective growth of silver on the polarized areas induced by nanoembossing. The induced rearrangements of domain distributions by embossing in the ferroelectric films have been characterized by piezoresponse force microscopy (PFM). The selective photochemical reduction of silver particles on the embossed nanostructures associated with the underlying domain patterns created by the nanoembossing process has been successfully demonstrated. This nanoembossing induced ferroelectric lithography (NIFL) developed in this work is expected to create an alternative route for nanoscale patterning of metals.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
