Abstract

In this work we study the effect of Cr impurities, diffused onto GaSb substrates, on the formation of nanodot hexagonal arrays created by low energy argon ion sputtering. For the same sputtering conditions, the dimensions of the dots in the Cr-diffused sample are smaller than in the case of the pure sample. EDX data revealed that the sputtering induces a more pronounced Ga enrichment in the case of Cr-diffused sample. It is proved that oblique incidence in rotating configuration most probably delays the formation of the nanodots compared to previously reported normal incidence experiments. The diffusion of Cr atoms onto the GaSb surface induced the formation of defects upon sputtering.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.