Abstract
High epitaxial quality BaTiO3 films were deposited on the MgO (001) substrate using RF magnetron sputtering at 800 °C by manipulating processing parameters. The BaTiO3 films have a ~200 nm thickness with a very low surface roughness but a rough interface structure with respect to the substrate. The epitaxial BaTiO3 films have a tetragonal crystal structure (a = 4.02 A and c = 4.11 A) with a tetragonality (c/a) of 1.02. The c-axis of the film is parallel to the growth direction as characterized by X-ray diffraction, electron diffraction, and high-resolution transmission electron microscopy. The orientation relationship between the film and the MgO is (001)BTO//(001)MgO and 〈100〉BTO//〈100〉MgO. Epitaxial nanodomains were formed in the film with a size ranging from 3 to 20 nm. The formation of the nanodomains is associated with the rough film/substrate interface due to the modification of the substrate surface characteristics (steps, terraces, and kinks) during the process. The two-dimensional interface structure between the film and the substrate was studied and its influence on the film microstructure is discussed.
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