Abstract
A PECVD (Plasma-enhanced Chemical Vapor Deposition) process operating at 150°C has been implemented to prepare micro-columnar porous TiO2 anatase thin films, performing post-annealing at 300°C for 5h. Optimized PECVD conditions have enabled us to obtain homogeneous films with thickness equal to 1–2μm±0.2μm. An anatase seeding interface deposited prior to the PECVD process has enabled us to reduce crystallization time down to 1.5h. The size of nano-crystals in prepared anatase thin films has been estimated to be 20nm by applying the Scherrer equation. Besides, the band-gap energy (Eg) of synthesized anatase thin films on quartz was found to be 3.30eV.
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