Abstract
Abstract Nano-diamond films were deposited at room temperature (≈ 300 K) on quartz, Si and Mo substrates by high pressure (≥ 45 mTorr) dc magnetron sputtering of vitreous carbon target in an argon + hydrogen (0–10 vol%) plasma. The nanocrystallites of diamond were embedded in a-C matrix and the ratio of sp3 and sp2 bonds in the film (determined from FTIR) was dependent on the deposition conditions. Formation of nanocrystallites was examined by TEM and SAD patterns. XRD and Raman spectroscopy were also used to probe the microstructural characteristics of the deposited films having average grain size ≈ 55 nm on quartz and ≈ 75 nm on Si and Mo substrates. The films had a surface roughness of ≈ 9 nm on quartz substrates. The sp3 content of the film was high (> 80%) leading to a high band gap (Eg ≈ 4.2 eV) and hardness (Hv≈ 30 GPa). Eg and Hv increased to 5 eV and 50 GPa respectively with the addition of hydrogen (≈10 vol%) in the sputtering environment.
Published Version
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