Abstract
The results of the study of electron properties evolution with nanocluster size of monodispersed thin films consisting of Ta, Mo, Co and Ni metal nanoclusters deposited onto the SiO2/Si(001) surface with magnetron sputtering method are presented. The changes in chemical composition and electron structure of the samples were controlled by means of X-ray photoelectron spectroscopy in the UHV analysis chamber of the Multiprobe MXPS RM VT AFM-25 surface analysis system. Susceptibility to oxidation after exposure to atmosphere was studied.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
