Abstract

This paper presents a fabrication method of nanobowl array by combining polystyrenes spheres (PSs) self-assembly, nanoimprint lithography (NIL), and lift-off process. A self-assembly monolayer of PSs on the quartz wafer is used as the nanoimprint mold. After separating the mold, the residual PSs onto the nanoimprint resist can be lifted off in the hydrofluoric acid solution and the nanobowl array is achieved. The size of the nanobowl can be modulated by the thickness of the nanoimprint resist. Using this method, different size of nanobowl arrays with high-resolution nanogap and nanoholes were fabricated, which has great potential to serve as a reaction container, catalyst and surface enhanced Raman scattering substrate.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.