Abstract
Titanium films with large atomically flat surfaces were produced by adapting the template stripping method. The morphology of these surfaces was characterized by contact mode atomic force microscopy and a root-mean-square roughness of 0.23 nm at a 1 µm2 area was obtained. Sample bias voltage modulation was used for nanometer-scale anodic oxidation of the Ti film. The oxide structures produced showed high reproducibility, with aspect ratios of 0.18 and 0.07 for voltage modulation and static pulse oxidation, respectively. The maximum height of oxide structures was found at ∼20 Hz voltage modulation frequency. Using a negative voltage on the sample in a combination with a Pt/Ir-coated tip enhanced further the aspect ratio and increased the oxide structure height. The influence of control parameters on the aspect ratio of the oxide structures was studied. Copyright © 2002 John Wiley & Sons, Ltd.
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