Abstract

We present a comprehensive investigation of the systematic and random errors of the nano-metrology instruments used to characterize synchrotron X-ray optics at Diamond Light Source. With experimental skill and careful analysis, we show that these instruments used in combination are capable of measuring state-of-the-art X-ray mirrors. Examples are provided of how Diamond metrology data have helped to achieve slope errors of <100 nrad for optical systems installed on synchrotron beamlines, including: iterative correction of substrates using ion beam figuring and optimal clamping of monochromator grating blanks in their holders. Simulations demonstrate how random noise from the Diamond-NOM's autocollimator adds into the overall measured value of the mirror's slope error, and thus predict how many averaged scans are required to accurately characterize different grades of mirror.

Highlights

  • In the last decade, improvements in metrology capabilities and the refinement of deterministic polishing techniques, such as ion beam figuring3 and elastic emission machining,4 have led to the creation of mirrors with only nanometer level height deviations from the ideal profile

  • Examples are provided of how Diamond metrology data have helped to achieve slope errors of

  • We summarize the nanometrology capabilities at Diamond Light Source and provide examples of how metrology instruments used in combination

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Summary

INTRODUCTION

Improvements in metrology capabilities and the refinement of deterministic polishing techniques, such as ion beam figuring and elastic emission machining, have led to the creation of mirrors with only nanometer level height deviations from the ideal profile. This monumental achievement has benefited many scientific disciplines. Optical defects are a major problem for creating: variable sized X-ray beams with smooth cross sections and high quality grating substrates for improved energy resolution. Since traditional polishing methods cannot create extreme quality non-planar optics, metrology instruments capable of providing accurate nano-feedback are necessary for iterative cycles of corrective deterministic polishing. 051902-2 Alcock, Nistea, and Sawhney can aid the creation of improved optical substrates mounted in strain-free opto-mechanical holders

EXPERIMENTAL
Fizeau interferometer
Stitching micro-interferometer
Reducing random and systematic errors
Metrology synergy
RESULTS AND DISCUSSION
Fabricating high quality optical substrates
Assembling beamline opto-mechanical systems
CONCLUSIONS
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