Abstract
Nano-structure fabrication is performed using focused ion beam (FIB) based on the nano-fabrication technique [N. Nitta and Taniwaki, Nucl. Instrum. Methods Phys. Res., B Beam Interact. Mater. Atoms 206 (2003) 482] previously proposed by the authors and its validity is examined. An initial pattern consisting of the matrices of the irradiated dots at constant intervals is prepared by raster scanning mode and it is developed by irradiation using the imaging mode in FIB at room temperature. An ordered cellular structure develops when the cell interval is 100 nm or more, which demonstrates that the proposed technique is promising for future nano-device processing.
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