Abstract
Nano-crystalline diamond (NCD) films have been grown on cemented carbide substrates by high current extended DC arc plasma process using Ar/H 2/CH 4 gas mixture at low gas pressure. The plain view and cross section of films are characterized with scanning electron microscopy. A uniform and smooth surface morphology of NCD thin films is observed. Raman spectroscopy has been used to investigate purity of the NCD films. Experimental results on the synthesis and characterization of the NCD films on cemented carbide substrates are discussed in this article.
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