Abstract
Co-based amorphous alloy films composed of nonnitride and nitride layers are prepared by N2 reactive sputtering. The layered films show soft magnetic property when the layer thickness is less than 300A. The saturation magnetization (4πMs) is increased by nitriding. 4πMs of the non-nitride films of the present study is about 7400 G and that of the layered films is about 8400 G. The layered structure changes into compositionally modulated structure after annealing above 400°C and 4πMs of the films is increased up to 11300 G. The compositionally modulated films are thermally stable and are found to have high crystallization temperature (Tx>600°C).
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