光アドレス型刺激電極の薄膜構成最適化

Abstract

Light addressing is an emerging technique to optically address a virtual electrode on a photoconductive substrate. A thinner photoconductive layer of a light-addressable planar electrode can improve the spatial resolution of the light-addressed electrode. Voltage application to the electrode, however, causes a strong electric field across the thin photoconductive layer with a significant avalanche effect, which induces an undesired increase of dark current. In order to overcome this problem, we investigated how photoconductive-layer thickness and passivation-layer conductivity affect voltage-application-induced bright and dark charge densities. Suppression of the dark charge density with a thick photoconductive layer and a low-conductive passivation layer is found to be a key factor for optimization of the light-addressable electrode. With this design strategy, we developed a novel light-addressable electrode using titanium dioxide as a photoconductor. To suppress the avalanche effect, the thickness of the titanium-dioxide layer was designed to be 1.5 μm. The fabricated electrode turned out to have sufficient photoelectric properties: the bright charge density reached 70 μC/cm2 and the bright-to-dark charge density ratio was greater than 10, which allows stimulation to cultured dissociated neurons. © 2010 Wiley Periodicals, Inc. Electron Comm Jpn, 94(1): 61–68, 2011; Published online in Wiley Online Library (wileyonlinelibrary.com). DOI 10.1002/ecj.10241