高周波マグネトロンスパッタ法により作製したＦｅ系酸化物光記録膜の光記録特性

Abstract

Approximately 30-nm thick iron films were deposited using an iron target with a high purity of 5 nine on glass or polycarbonate substrate by radio-frequency magnetron sputtering, in order to use for media of the write-once disk. The transmittance change between the as-deposited state and the annealed state (500°C×10 min) was about 18% at the wavelength of 400 nm. For the films on the polycarbonate substrate, the CNR of 42 dB was obtained at a peak power of 8 mW (at λ=406 nm, NA=0.65). On this time, we observe recording pits (diameter of about 0.26 μm) written at the peak power of 10 mW.