Abstract
For dry vacuum pumps, typically used for chemical vapor deposition (CVD) and Etching process in semiconductor factory, the durability of byproduct deposition and /or corrosion is very important. And also energy saving is one of the key factor on this application for cost ownership stand point. Our ``Model EV-M'' dry pumps have achieved significant enhancement for saving energy consumption, and have incorporated various countermeasures against byproduct deposition and corrosion, like optimized internal temperature profile and material selection. With these, both significant saving energy and process durability can be achieved under the use of the harsh duty condition such as CVD and Etching process. (Note: EV-M is Ebara's model code)
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
